Direct growth of graphene on nickel electrode at low temperature

Haslinawati Mohd Mustapha, Mohd Ambri Mohamed, Azrul Azlan Hamzah, B.Y. Majlis


Graphene has become attractive material because of its wide range of potential application. One of the concern to utilize this application is for industrial needs, which requires a large scale of high quality graphene directly on substrate without encounter any transfer process that will lead to device performance deterioration. Plasma Enhanced Chemical Vapor Deposition (PECVD) technique offered a good features in shortening the growth time and lowering the temperature therefore make this technique the most suitable approach. In this regard, we demonstrate a direct growth of graphene on Nickel electrode deposited on Si substrate. The characterization was carried out by 3D Optical Microscopy, Scanning Electron Microscopy, Raman Spectroscopy and Atomic Force Microscopy.


Graphene; Plasma Enhanced Chemical Vapor Deposition; Nickel electrode; Low Temperature

Full Text:



Yi Zhang, Luyao Zhang, Chongwu Zhou, “Review of achpepmlicicaatilo nvs”a,p oArc cdoeupnotss itoiof nC hoefm icgaral pRheenseea racnhd, vorel.l a4te6d, pp. 2329-2339, 2013.

WWaein gL, iBu,i -CYhuono Lngi,- LHienugi- YCahnu nRgu, aCn,o Knge-tQanin P aMteila,o Y, oYuanng--JJiue dPeaprko,s itiJoanso no f Wlaorog,e Yarae-aH ofnegw Xlaiyee, r “Cgrhaepmheicnael ovna pSori cpapt.a 1ly2z8e-d1 3w2,i t2h0 n1i0c.k


  • There are currently no refbacks.

Copyright (c) 2017 eProceedings Chemistry

Creative Commons License
This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.

Copyright © 2016 Department of Chemistry, Universiti Teknologi Malaysia.

Disclaimer : This website has been updated to the best of our knowledge to be accurate. However, Universiti Teknologi Malaysia shall not be liable for any loss or damage caused by the usage of any information obtained from this web site.
Best viewed: Mozilla Firefox 4.0 & Google Chrome at 1024 × 768 resolution.